DocumentCode

330642

Title

Progress In The Development Of Extreme Ultraviolet Lithography Exposure Systems

Author

Ray-Chaudhuri, A.

Author_Institution

Sandia National Laboratories

fYear

1998

fDate

13-16 July 1998

Firstpage

75

Lastpage

75

Keywords

Lithography; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729973

Filename

729973