DocumentCode :
330643
Title :
Ring-Field EUV Exposure System Using Aspheric Mirrors
Author :
Murakarni, K. ; Oshino, T. ; Kinoshita, H. ; Watanabe, T. ; Niibe, M. ; Itou, M. ; Oizumi, H. ; Yamanashi, H.
Author_Institution :
Nikon Corporation
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
76
Lastpage :
76
Keywords :
Laboratories; Mirrors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729974
Filename :
729974
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330643