Ring-Field EUV Exposure System Using Aspheric Mirrors

Author

Murakarni, K. ; Oshino, T. ; Kinoshita, H. ; Watanabe, T. ; Niibe, M. ; Itou, M. ; Oizumi, H. ; Yamanashi, H.

Author_Institution

Nikon Corporation

fYear

1998

fDate

13-16 July 1998

Firstpage

Lastpage

Keywords

Laboratories; Mirrors;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.729974

Filename

729974

Link To Document