DocumentCode :
330654
Title :
Optical Lithography At Low /spl kappa/ Factors
Author :
Sewell, H.
Author_Institution :
SVG Lithography Systems, Inc.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
97
Lastpage :
97
Keywords :
Lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729988
Filename :
729988
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330654
