DocumentCode

330654

Title

Optical Lithography At Low /spl kappa/ Factors

Author

Sewell, H.

Author_Institution

SVG Lithography Systems, Inc.

fYear

1998

fDate

13-16 July 1998

Firstpage

97

Lastpage

97

Keywords

Lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729988

Filename

729988