مرکز منطقه ای اطلاع رساني علوم و فناوري - Printing Sub-100 Nanometer Features Near-Field Photolithography

DocumentCode :

330656

Title :

Printing Sub-100 Nanometer Features Near-Field Photolithography

Author :

Tanaka, Shuji ; Nakao, Masayuki ; Hatamura, Yotaro ; Komuro, Masanori ; Hiroshima, Hiroshi ; Hatakeyama, Masahiro

Author_Institution :

The Univ. of Tokyo

fYear :

1998

fDate :

13-16 July 1998

Firstpage :

100

Lastpage :

101

Keywords :

Contamination; Costs; Diffraction; Equations; Laser beams; Lithography; Optical surface waves; Plastics; Printing; Resists;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location :

Kyoungju, South Korea

Print_ISBN :

4-930813-83-2

Type :

conf

DOI :

10.1109/IMNC.1998.729991

Filename :

729991

Link To Document :