• DocumentCode
    330662
  • Title

    Reduction of Image Shortening in Two-Dimensional Pattern Replication using X-Ray Lithography

  • Author

    Nakanishi, Kazuya ; Deguchi, Kimiyoshi ; Matsuda, Tadahito

  • Author_Institution
    NTT System Electronics Laboratories
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    113
  • Lastpage
    114
  • Keywords
    Biomembranes; Chemical processes; Diffraction; Electronic switching systems; Laboratories; Large scale integration; Resists; Silicon compounds; Strontium; X-ray lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.729998
  • Filename
    729998
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330662