DocumentCode :
330662
Title :
Reduction of Image Shortening in Two-Dimensional Pattern Replication using X-Ray Lithography
Author :
Nakanishi, Kazuya ; Deguchi, Kimiyoshi ; Matsuda, Tadahito
Author_Institution :
NTT System Electronics Laboratories
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
113
Lastpage :
114
Keywords :
Biomembranes; Chemical processes; Diffraction; Electronic switching systems; Laboratories; Large scale integration; Resists; Silicon compounds; Strontium; X-ray lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729998
Filename :
729998
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330662
بازگشت