DocumentCode
3306626
Title
High-speed, low-threshold InGaAsP semi-insulating buried crescent lasers
Author
Mar, A. ; Bowers, J. ; Huang, R.-T. ; Wolf, D. ; Cheng, W.-H. ; Jiang, C.-L. ; Agarwal, R. ; Renner, D.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
fYear
1992
fDate
21-24 April 1992
Firstpage
473
Lastpage
476
Abstract
The authors describe the refinement of this laser structure for high-speed operation and record bandwidths for a planar structure. To achieve bandwidths in excess of 20 GHz, it is necessary to increase the slope of the resonance frequency vs. output power so that higher bandwidths are achieved at lower bias currents. This is accomplished by reducing the active channel width to 1 mu m, by p-doping the active layer, and by cleaving cavity lengths as short as 100 mu m. In addition, the parasitic capacitance is further reduced by limiting the p-contact width to 12 mu m, and by the use of a thick polyimide layer under the bond pad metal. Lasers fabricated in this manner exhibited thresholds as low as 6 mA, with maximum output powers of 15 mW per facet at 100 mA bias current. The total differential quantum efficiency was typically 45-55%.<>
Keywords
III-V semiconductors; gallium arsenide; high-speed optical techniques; indium compounds; semiconductor lasers; 1 micron; 100 mA; 100 micron; 15 mW; 20 GHz; 45 to 55 percent; 6 mA; InGaAsP; SIBC laser; active channel width; bandwidths; bond pad metal; cavity lengths; differential quantum efficiency; high-speed operation; low-threshold InGaAsP semi-insulating buried crescent lasers; lower bias currents; output power; output powers; p-contact width; p-doping; parasitic capacitance; planar structure; resonance frequency; thick polyimide layer; thresholds; Bandwidth; Bonding; Damping; Electrical resistance measurement; Fiber lasers; Parasitic capacitance; Power generation; Power lasers; Resonance; Resonant frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1992., Fourth International Conference on
Conference_Location
Newport, RI, USA
Print_ISBN
0-7803-0522-1
Type
conf
DOI
10.1109/ICIPRM.1992.235561
Filename
235561
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