DocumentCode :
330664
Title :
High-Transmittance SiC Membrane Prepared By ECR Plasma CVD In Combination With Rapid Thermal Annealing
Author :
Song, Ki-Chang ; Lee, Don-Hee ; Jeon, Young-Sam ; Park, Chil-Keun ; Noh, Hyun Pil ; Lee, Seung-Yoon ; Lee, Tae-Ho ; Kang, Jung-Ho ; Ahn, Jinho
Author_Institution :
LG Corporate Institute of Technology
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
117
Lastpage :
118
Keywords :
Biomembranes; Compressive stress; Optical films; Plasma temperature; Rapid thermal annealing; Residual stresses; Rough surfaces; Silicon carbide; Surface roughness; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730001
Filename :
730001
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330664
