Title :
Evaluation of Image Shortening Effects with Rectangular Array Patterns in X-Ray Lithography
Author :
Mitsui, S. ; Tanaka, Y. ; Taguchi, T. ; Gomei, Y. ; Hisatsugu, T.
Author_Institution :
Association of Super-Advanced Electronics Technologies (ASET)
Keywords :
Chemicals; Electronics industry; Energy resolution; Industrial electronics; Laboratories; Resists; Silicon compounds; X-ray lithography;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730002
