DocumentCode
330666
Title
A Research On The Anisotropic Etching Of Tungsten-Nitride For X-Ray Mask
Author
Lee, H.G. ; Jeong, C.Y. ; Lee, S.Y. ; Ahn, J. ; Song, K.C. ; Park, C.K. ; Jeon, Y.S. ; Lee, D.H.
Author_Institution
Hanyang University
fYear
1998
fDate
13-16 July 1998
Firstpage
121
Lastpage
122
Keywords
Anisotropic magnetoresistance; Atomic measurements; Cooling; Etching; Gases; Lithography; Maintenance engineering; Power measurement; Strontium; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730003
Filename
730003
Link To Document