DocumentCode

330667

Title

A Design Of Beamline Optics For Large Field Exposure

Author

Hasegawa, M. ; Gomei, Y. ; Hisatsugu, T.

Author_Institution

Super fine SR Lithography Laboratory, ASET

fYear

1998

fDate

13-16 July 1998

Firstpage

123

Lastpage

124

Keywords

Design optimization; Lithography; Mirrors; Optical beams; Optical design; Optical devices; Particle beam optics; Power distribution; Production; Shape;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730004

Filename

730004