DocumentCode :
330668
Title :
Impact Of Metallization Films On Scattered-Light Alignment For X-Ray Lithography
Author :
Miyatake, Tsuomu ; Hirose, Masaoki ; Shoki, Tsutomu ; Ohkubo, Ryo ; Yamazaki, Kuniaki
Author_Institution :
Sumitomo Heavy Industries, Ltd.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
125
Lastpage :
126
Keywords :
Aluminum; Artificial intelligence; Atherosclerosis; Metallization; Particle scattering; Semiconductor films; Testing; Thickness measurement; X-ray lithography; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730005
Filename :
730005
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330668
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