DocumentCode
330669
Title
Improvement Of Overlay Accuracy In SR Lithography For Gigabit-Scale Dram Fabrication
Author
Suita, Muneyoshi ; Hifumi, Takashi ; Sumitani, Hiroaki ; Itoga, Kenji ; Ootera, Hiroki ; Marumoto, Kenji ; Wakamiya, Wataru ; Matsumoto, Takahiro ; Yamamoto, Takeshi ; Edo, Ryo ; Ohishi, Satoru ; Sentoku, Koichi
Author_Institution
Mitsubishi Electric Corp.
fYear
1998
fDate
13-16 July 1998
Firstpage
127
Lastpage
128
Keywords
Error correction; Fabrication; Laboratories; Lithography; Nanotechnology; Random access memory; Research and development; Resists; Strontium; Synchrotrons;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730006
Filename
730006
Link To Document