Title :
Sub-0.1-/spl mu/m Patterning Characteristics of Inorganic Resists by Focused-Ion-Beam Lithography
Author :
Paek, Seung Woo ; Park, Soo-Ho ; Lee, Hyun Yong ; Chung, Hong Bay
Author_Institution :
Kwangwoon University
Keywords :
Annealing; Dry etching; Inorganic materials; Polymers; Resists; Solvents; Substrates; Vacuum technology; Water; X-ray lithography;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730007
