Title :
Simulation Of Electron Trajectory In The Cell-Projection Lithography Optical System
Author :
Yamaguchi, K. ; Kotera, M.
Author_Institution :
Osaka Institute of Technology
Keywords :
Acceleration; Cathodes; Electrodes; Electron beams; Electron emission; Electron optics; Lenses; Lithography; Optical beams; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730010
