DocumentCode :
330674
Title :
Fabrication Of Silicon Quantum Dots On Oxide And Nitride
Author :
Kim, Ilgweon ; Kim, Hyungsik ; Lee, Jongho ; Shin, Hyungcheol
Author_Institution :
KAIST
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
136
Lastpage :
137
Keywords :
Chemicals; Fabrication; Quantum dots; Rough surfaces; Silicon; Substrates; Surface roughness; Surface treatment; Temperature; US Department of Transportation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730011
Filename :
730011
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330674
بازگشت