DocumentCode
330690
Title
Influence Of Interface Structure On Chemical Etching Process For Air Gap Of Microelectromechanical System Based On Surface Micromachining
Author
Yoon, Y.S. ; Kim, J.H. ; Polla, D.L.
Author_Institution
University of Minnesota
fYear
1998
fDate
13-16 July 1998
Firstpage
168
Lastpage
169
Keywords
Annealing; Chemical engineering; Chemical processes; Chemical technology; Electrodes; Etching; Microelectromechanical devices; Micromachining; Piezoelectric films; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730027
Filename
730027
Link To Document