Title :
Influence Of Interface Structure On Chemical Etching Process For Air Gap Of Microelectromechanical System Based On Surface Micromachining
Author :
Yoon, Y.S. ; Kim, J.H. ; Polla, D.L.
Author_Institution :
University of Minnesota
Keywords :
Annealing; Chemical engineering; Chemical processes; Chemical technology; Electrodes; Etching; Microelectromechanical devices; Micromachining; Piezoelectric films; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730027
