DocumentCode :
3307017
Title :
Gate tunneling current in In/sub 0.53/Ga/sub 0.47/As junction field-effect transistors
Author :
Chung, Y.K. ; Lo, D.C.W. ; Forrest, S.R.
Author_Institution :
Univ. of Southern California, Los Angeles, CA, USA
fYear :
1992
fDate :
21-24 April 1992
Firstpage :
393
Lastpage :
396
Abstract :
Data are presented which conclusively eliminate channel current impact ionization as the dominant source of gate leakage current in InGaAs JFETs based on both the temperature and channel current dependence. At the same time, strong evidence is presented which indicates that band-to-band tunneling at the gate-drain interface is the dominant source of gate leakage current. Based on these and previous results, it is concluded that InGaAs JFETs in linear preamplifiers such as optical receivers have an optimum channel doping of approximately 9*10/sup 16/ cm/sup -3/ at a bandwidth of 1 GHz. This value is obtained based on a tradeoff between gain, bandwidth, and noise.<>
Keywords :
III-V semiconductors; gallium arsenide; impact ionisation; indium compounds; junction gate field effect transistors; leakage currents; tunnelling; 1 GHz; In/sub 0.53/Ga/sub 0.47/As; JFETs; band-to-band tunneling; bandwidth; channel current impact ionization; gain; gate leakage current; gate-drain interface; junction field-effect transistors; linear preamplifiers; noise; optical receivers; optimum channel doping; Bandwidth; Doping; Impact ionization; Indium gallium arsenide; JFETs; Leakage current; Optical receivers; Preamplifiers; Temperature dependence; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1992., Fourth International Conference on
Conference_Location :
Newport, RI, USA
Print_ISBN :
0-7803-0522-1
Type :
conf
DOI :
10.1109/ICIPRM.1992.235580
Filename :
235580
Link To Document :
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