Title :
Radical Interactions With Electrode Surfaces In Parallel-Plate-Type RIE
Author :
Morishita, S. ; Hayashi, H. ; Tatsumi, T. ; Noda, S. ; Okigawa, M. ; Hikosaka, Y. ; Inoue, M.
Author_Institution :
Association of Super-Advanced Electronics Technologies (ASET)
Keywords :
Electrodes; Electrons; Etching; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Polymers;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730052
