Title :
Micro-Etching Technology Of High Aspect Ratio Framework For Electronic Devices
Author :
Cho, Y.R. ; Oh, J.Y. ; Kim, H.S. ; Jeong, H.S.
Author_Institution :
Electronic Materials Lab., Institute for Advanced Engineering
Keywords :
Aluminum oxide; Displays; Etching; Glass; Impurities; Lithography; Mechanical systems; Microelectronics; Microstructure; Vacuum systems;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730054
