Title :
Study Of Self-Limiting Etching Behavior In Wet Isotropic Etching Of Silicon
Author :
Han, C.-H. ; Kim, E.S.
Author_Institution :
University of Hawaii at Manoa
Keywords :
Adhesives; Hafnium; Hydrogen; Lenses; Microelectromechanical systems; Micromechanical devices; Rough surfaces; Silicon; Surface roughness; Wet etching;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730056
