DocumentCode :
330721
Title :
Epitaxial Growth Of GaN By HWP(Helicon Wave Plasma) Assisted Metal-Organic CVD (Chemical Vapor Deposition) Process
Author :
Kim, Ki-Sung ; Chun, Chan-Wook ; Kim, Seon-Hyo
Author_Institution :
Pohang University of Science and Technology
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
233
Lastpage :
236
Keywords :
Argon; Epitaxial growth; Gallium nitride; Magnetic field measurement; Plasma density; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Plasma waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730059
Filename :
730059
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330721
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