• DocumentCode
    330724
  • Title

    Structural And Compositional Evolution Of SiO/sub 2/ Aerogel Film By Oxygen Plasma Treatment

  • Author

    Kim, Hong-Ryul ; Park, Hyung-Ho

  • Author_Institution
    Yonsei University
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    242
  • Lastpage
    243
  • Keywords
    Chemicals; Leakage current; Oxygen; Plasma chemistry; Plasma density; Plasma properties; Plasma temperature; Semiconductor films; Surface morphology; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730062
  • Filename
    730062