Title :
Study Of Bottom Antireflective Coating Process Using A High-Transparency Resist For ArF Excimer Laser Lithography
Author :
Kishimura, Shinji ; Takahashi, Makoto ; Ohfuji, Takeshi ; Sasago, Masaru
Author_Institution :
Association of Super-Advanced Electronics Technologies
Keywords :
Chemicals; Coatings; Controllability; Etching; Interference; Lithography; Reflectivity; Resists; Surfaces; Thermal degradation;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730073
