• DocumentCode
    330736
  • Title

    Positive-Tone E-Beam Lithography With Surface Silylation Of Negative-Tone Commercial Photoresists Sal 601 And AZPN 114

  • Author

    Tegou, Evangelia ; Gogolides, Evangelos ; Argitis, Panagiotis ; Cui, Zheng

  • Author_Institution
    Institute of Microelectronics IMEL
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    265
  • Lastpage
    266
  • Keywords
    Electron beams; Etching; Laboratories; Lithography; Microelectronics; Microstructure; Paramagnetic resonance; Plasma applications; Resists; Solvents;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730074
  • Filename
    730074
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330736