DocumentCode :
330740
Title :
Stitching-Error-Free Overlay Metrology For EB Lithography Using "One-Shot" Inspection Target Mark
Author :
Asano, Koji ; Takahashi, Kimitoshi ; Nagata, Takep ; Sato, Masami ; Nara, Yasuno
Author_Institution :
ULSI Technology Laboratory, Fujitsu Laboratories Ltd.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
273
Lastpage :
274
Keywords :
Electron beams; Inspection; Laboratories; Lithography; Manufacturing; Metrology; Petroleum; Reproducibility of results; Ultra large scale integration; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730078
Filename :
730078
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330740
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