DocumentCode :
3307437
Title :
Lateral bandgap engineering for InP-based photonic integrated circuits
Author :
Coudenys, G. ; Moerman, I. ; Zhu, Y. ; Van Daele, P. ; Demeester, P.
Author_Institution :
Interuniv. Microelectron. Centre, Gent Univ., Belgium
fYear :
1992
fDate :
21-24 April 1992
Firstpage :
202
Lastpage :
205
Abstract :
It is demonstrated that both SMG (shadow masked growth) and SG (selective growth) together with the use of QWs (quantum wells) can change the bandgap of InP-based materials laterally over the substrate. The thickness change that can be obtained with both techniques and the corresponding deviation from stoichiometry are competitive. The authors present the basic principle of both techniques and the basic characteristics (thickness and composition change). They have fabricated a multiwavelength laser array using SMG with a wavelength span of 130 nm around 1550 nm.<>
Keywords :
III-V semiconductors; energy gap; gallium arsenide; indium compounds; integrated optoelectronics; semiconductor growth; semiconductor laser arrays; semiconductor quantum wells; vapour phase epitaxial growth; 1420 to 1680 nm; InP-InGaAsP; MOCVD; lateral bandgap engineering; multiwavelength laser array; photonic integrated circuits; quantum wells; selective growth; shadow masked growth; Acoustical engineering; Acoustics; Detectors; Indium gallium arsenide; Indium phosphide; Laboratories; Microelectronics; Photonic band gap; Photonic integrated circuits; Thickness control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1992., Fourth International Conference on
Conference_Location :
Newport, RI, USA
Print_ISBN :
0-7803-0522-1
Type :
conf
DOI :
10.1109/ICIPRM.1992.235604
Filename :
235604
Link To Document :
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