Title :
Sub-Wavelength Pattern Transfer By Near Field Photo-Lithography
Author :
Takahito, One ; Mika, Ohtomo ; Esashi, Masayoshi
Author_Institution :
Tohoku University
Keywords :
Apertures; Atomic force microscopy; Biomembranes; Glass; Lithography; Optical films; Optical microscopy; Optical surface waves; Resists; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730083
