Title :
In-Situ Observation Of FIB Micropatterning To Semiconductors
Author :
Tanaka, Miyoko ; Furuya, Kazuo ; Saito, Tetsuya
Author_Institution :
National Research Institute for Metals
Keywords :
Amorphous materials; Electron beams; Focusing; Gallium arsenide; Instruments; Ion beams; Laser excitation; Production; Semiconductor materials; Silicon carbide;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730093
