مرکز منطقه ای اطلاع رساني علوم و فناوري - Resist Development Process For Sub-0.15/spl mu/m Lithography By KrF Imaging

DocumentCode :

330762

Title :

Resist Development Process For Sub-0.15/spl mu/m Lithography By KrF Imaging

Author :

Matsunaga, K. ; Kawamura, D. ; Mimotogi, S. ; Azuma, T. ; Onishi, Y.

Author_Institution :

Toshiba Corporation

fYear :

1998

fDate :

13-16 July 1998

Firstpage :

319

Lastpage :

320

Keywords :

Chemical processes; Data analysis; High-resolution imaging; Image resolution; Lithography; Resists;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location :

Kyoungju, South Korea

Print_ISBN :

4-930813-83-2

Type :

conf

DOI :

10.1109/IMNC.1998.730101

Filename :

730101

Link To Document :