DocumentCode :
330769
Title :
Fabrication Of Nanometer-Order Dot Patterns By Lift-Off Using Fullerene-Incorporated Bilayer Resist System
Author :
Ishii, Tetsuyoshi ; Tanaka, Hirotaka ; Kuramochi, Eiichi ; Tamamura, Toshiaki
Author_Institution :
NTT Opto-Electronics Laboratories
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
333
Lastpage :
334
Keywords :
Control systems; Electron beams; Laboratories; Lithography; Optical arrays; Optical device fabrication; Quantum dot lasers; Resists; US Department of Transportation; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730108
Filename :
730108
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330769
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