DocumentCode :
330773
Title :
Sub-Quarter-Micron PT Etching Technology Using Round Head EB Resist
Author :
Yunogami, Takashi ; Kumihashi, Takao
Author_Institution :
Hitachi Ltd.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
340
Lastpage :
341
Keywords :
Anisotropic magnetoresistance; Argon; Fluid flow measurement; Lithography; Magnetic heads; Power measurement; Radio frequency; Resists; Shape; Sputter etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730112
Filename :
730112
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330773
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