DocumentCode
3307792
Title
Photoconductivity of a strained InAs/InP superlattice in the 1.0-1.5 mu m region
Author
Stavrinou, P. ; Haywood, S.K. ; Zhang, X. ; Hopkinson, M. ; Claxton, P.A. ; David, J.P.R. ; Hill, G.
Author_Institution
Dept. Electron. & Electr. Eng., Univ. Coll., London, UK
fYear
1992
fDate
21-24 April 1992
Firstpage
569
Lastpage
572
Abstract
The authors studied the first device structures in the compressive strain limit of the In(Ga)As/InP system. Strong excitonic transitions were observed in the photocurrent spectrum between 1.1 and 1.5 mu m. The hh1 to e1 transition showed a large Stark shift for such narrow wells (15 AA). A relatively simple model accurately predicted both allowed and forbidden heavy hole transitions for the strained, five-monolayer wells. However, the separation of the lh1 to e1 and hh1 to e1 transitions suggests either some relaxation of the strain or a degree of alloying. A structure containing this number of highly strained narrow wells places severe demands on the growth. The results obtained suggest that one of these constraints needs to be relaxed to obtain uniform, pseudomorphic MQWs (multiquantum wells). Nevertheless the strength of the excitonic transitions and magnitude of the Stark shift are encouraging for the fabrication of MQW detectors and modulators in the InGaAs/InP system using intermediate levels of strain and somewhat thicker wells.<>
Keywords
III-V semiconductors; Stark effect; excitons; indium compounds; photoconductivity; semiconductor superlattices; 1.0 to 1.5 micron; InP-InAs; Stark shift; compressive strain limit; detectors; excitonic transitions; heavy hole transitions; highly strained narrow wells; modulators; multiquantum wells; photoconductivity; semiconductors; superlattice; Alloying; Capacitive sensors; Detectors; Fabrication; Indium gallium arsenide; Indium phosphide; Photoconductivity; Predictive models; Quantum well devices; Superlattices;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1992., Fourth International Conference on
Conference_Location
Newport, RI, USA
Print_ISBN
0-7803-0522-1
Type
conf
DOI
10.1109/ICIPRM.1992.235624
Filename
235624
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