DocumentCode :
3307836
Title :
Absorption measurements of doped thin film InP for solar cell modeling
Author :
Augustine, G. ; Jokerst, N.M. ; Rohatgi, A.
Author_Institution :
Sch. of Electr. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
1992
fDate :
21-24 April 1992
Firstpage :
557
Lastpage :
560
Abstract :
The first direct transmission measurement of above bandedge absorption coefficients in InP are reported. A novel technique for fabricating high-quality single crystal InP thin films is used to fabricate the thin films for transmission measurements. Two InP thin films were fabricated in this manner, one with a doping concentration of 1.4*10/sup 17/ cm/sup -3/ and the other with a doping concentration of 32*10/sup 18/ cm/sup -3/. Absorption coefficients were obtained from transmission measurements made on these two films, and were used to calculate the cell performance and quantum efficiency of an InP solar cell. These results were then compared with similar calculations made on the same cell using absorption coefficients for undoped InP, which are commonly used due to the lack of absorption coefficient data for doped InP. Model calculations with the directly measured absorption coefficients resulted in a cell efficiency which was significantly different from the efficiency of the cell with undoped InP absorption coefficients. This demonstrates that correct absorption coefficients are necessary to accurately model InP devices which utilize highly doped regions.<>
Keywords :
III-V semiconductors; indium compounds; light absorption; light transmission; optical constants; semiconductor thin films; solar cells; above bandedge absorption coefficients; cell performance; doped thin film; high-quality single crystal; quantum efficiency; semiconductor; solar cell modeling; transmission measurements; Absorption; Doping; Etching; Fabrication; Gallium arsenide; Indium phosphide; Photovoltaic cells; Semiconductor process modeling; Substrates; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1992., Fourth International Conference on
Conference_Location :
Newport, RI, USA
Print_ISBN :
0-7803-0522-1
Type :
conf
DOI :
10.1109/ICIPRM.1992.235627
Filename :
235627
Link To Document :
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