• DocumentCode
    330792
  • Title

    The thermal impedance of new power semiconductor modules using AlN substrates

  • Author

    Mitic, G. ; Sommer, K.-H. ; Dieci, D. ; Lefranc, G.

  • Author_Institution
    Corp. Technol. Dept., Siemens AG, Munich, Germany
  • Volume
    2
  • fYear
    1998
  • fDate
    12-15 Oct. 1998
  • Firstpage
    1026
  • Abstract
    Increasing operating voltages of IGBT modules result in higher dissipation heat as well as additional requirements on the insulation and partial discharge. The most important part affected here is the substrate. AlN ceramic with a thermal conductivity of typically /spl lambda/=180 W/mK is clearly superior to the conventional Al/sub 2/O/sub 3/ ceramic at /spl lambda/=27 W/mK. The thermal and thermomechanical properties of AlN substrates have been investigated in view of IGBT modules. Measurements of the thermal resistance R/sub th/ of the AlN substrates assembled with IGBTs gave values less than that of Al/sub 2/O/sub 3/ substrates by a factor greater than three. In complete IGBT power modules a factor of two is achieved. Temperature cycling test of AlN substrates and modules show a reliability similar to those of Al/sub 2/O/sub 3/ i.e. the reliability requirements are fulfilled.
  • Keywords
    aluminium compounds; ceramics; insulated gate bipolar transistors; modules; substrates; thermal analysis; thermal conductivity; thermal resistance measurement; AlN; AlN ceramic; AlN substrates; IGBT modules; higher dissipation heat; insulation; operating voltages; partial discharge; power semiconductor modules; quality requirements; reliability requirements; temperature cycling test; thermal conductivity; thermal impedance; thermal properties; thermal resistance measurements; thermomechanical properties; Ceramics; Impedance; Insulated gate bipolar transistors; Insulation; Partial discharges; Substrates; Thermal conductivity; Thermal resistance; Thermomechanical processes; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industry Applications Conference, 1998. Thirty-Third IAS Annual Meeting. The 1998 IEEE
  • Conference_Location
    St. Louis, MO, USA
  • ISSN
    0197-2618
  • Print_ISBN
    0-7803-4943-1
  • Type

    conf

  • DOI
    10.1109/IAS.1998.730272
  • Filename
    730272