Stress control for process optimization of the capacitive pressure sensors for biomedical applications achieved by surface micromachining technology

Author

Gaiseanu, F. ; Postolache, C. ; Dascalu, D. ; Esteve, J. ; Tsoukalas, D. ; Jachowicz, R. ; Badoiu, A. ; Vasile, E.

Author_Institution

Nat. Inst. of Res.-Dev. for Microtechnol., Bucharest, Romania

Volume

1

fYear

1998

fDate

6-10 Oct 1998

Firstpage

71

Abstract

An integrated structure of capacitive pressure sensor for biomedical applications achieved by surface micromachining technology, consisting in the pressure sensor and a testing component is presented. The test structure permitted to apply the pull-in voltage method for the evaluation of the residual stress in the polysilicon layer on the basis of a new form of the set of two equations describing the beam pull-in voltage effect. The integrated structure allowed the optimization of the phosphorus diffusion process to obtain low stress polysilicon membranes of the capacitive pressure sensors for biomedical applications

Keywords

biosensors; capacitive sensors; internal stresses; micromachining; microsensors; pressure sensors; stress control; Si:P; biomedical application; capacitive pressure sensor; integrated structure; phosphorus diffusion; polysilicon membrane; process optimization; pull-in voltage; residual stress control; surface micromachining technology; testing; Biomembranes; Biosensors; Capacitive sensors; Diffusion processes; Equations; Micromachining; Residual stresses; Stress control; Testing; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International

Conference_Location

Sinaia

Print_ISBN

0-7803-4432-4

Type

conf

DOI

10.1109/SMICND.1998.732280

Filename

732280