• DocumentCode
    331092
  • Title

    Decay behaviour of UV-induced defects in Ge-doped SiO2 glass

  • Author

    Ohama, M. ; Fujiwara, T. ; Ikushima, A.J.

  • Author_Institution
    Res. Center for Adv. Photonic Technol., Toyota Technol. Inst., Nagoya, Japan
  • Volume
    1
  • fYear
    1998
  • fDate
    20-24 Sep 1998
  • Firstpage
    141
  • Abstract
    Decay behaviour of photo-induced defects in a Ge-doped SiO2 glass with photosensitivity and 2nd-order optical nonlinearity has been presented. It has been found that the decay of induced GeE´ in a UV-irradiated glass is quite different from that in a UV-poled glass
  • Keywords
    germanate glasses; optical glass; optical harmonic generation; sensitivity; 2nd-order optical nonlinearity; Ge-doped SiO2 glass; SiO2:Ge; UV-induced defects; UV-irradiated glass; UV-poled glass; decay behaviour; photo-induced defects; photosensitivity; Electromagnetic wave absorption; Energy measurement; Glass; Laser beam cutting; Optical harmonic generation; Optical pulses; Photonic crystals; Photorefractive effect; Preforms; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Communication, 1998. 24th European Conference on
  • Conference_Location
    Madrid
  • Print_ISBN
    84-89900-14-0
  • Type

    conf

  • DOI
    10.1109/ECOC.1998.732474
  • Filename
    732474