DocumentCode
3311038
Title
Tunable Screening of Inter-Contact Plasmons by a Recessed Gate in Field-Effect Transistor with Two-Dimensional Electron Channel
Author
Popov, V.V. ; Polischuk, O.V. ; Teperik, T.V. ; Shur, M.S.
Author_Institution
Inst. of Radio Eng. & Electron., Russian Acad. of Sci., Saratov
Volume
2
fYear
2007
fDate
25-30 June 2007
Firstpage
848
Lastpage
850
Abstract
This work studies field-effect transistors (FET) with two-dimensional electron channel. It is theoretically shown that the frequencies of higher-order resonances of the ungated plasmon modes can be effectively tuned by the gate-voltage variation at a short recessed gate, which mimic conventional gated plasmon resonance but with a much stronger efficiency. The calculated THz absorption spectra of a FET with a short recessed gate are presented. Results show that the frequency of the second-order inter-contact plasmon resonance can be tuned by applying the gate voltage producing the electron density variation in the short gated region of the channel.
Keywords
electronic density of states; field effect transistors; plasmons; semiconductor plasma; submillimetre wave spectra; submillimetre wave transistors; FET; THz absorption spectra; electron density; field-effect transistor; gate-voltage variation; higher-order resonances; plasma oscillations; recessed gate; second-order intercontact plasmon resonance; tunable screening; two-dimensional electron channel; ungated plasmon mode tuning; Data engineering; Dielectric constant; Electrodes; Electrons; FETs; Frequency estimation; Plasma applications; Plasma sources; Plasmons; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Physics and Engineering of Microwaves, Millimeter and Submillimeter Waves and Workshop on Terahertz Technologies, 2007. MSMW '07. The Sixth International Kharkov Symposium on
Conference_Location
Kharkov
Print_ISBN
1-4244-1237-4
Type
conf
DOI
10.1109/MSMW.2007.4294835
Filename
4294835
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