Title :
Split-gate Resurf Stepped Oxide (RSO) MOSFETs for 25V applications with record low gate-to-drain charge
Author :
Goarin, P. ; Koops, G.E.J. ; van Dalen, R. ; Le Cam, C. ; Saby, J.
Author_Institution :
NXP Semicond., Leuven
Abstract :
This paper presents a split-gate version of the resurf stepped oxide (RSO) MOSFET. Splitting the gate enables a drastic reduction of the gate-to-drain capacitance intrinsic to the RSO device concept while keeping all the benefits of the RESURF effect. We achieved a record on- resistance of 3.8 mOmegamm2 and gate-to-drain charge of 0.9 nC.mm-2 at a breakdown voltage of 35 V for a pitch of 1.3 mum (0.8 mum trench width). The switching losses of our split-gate RSO MOSFET are 4 times better than the best published data in the same voltage range.
Keywords :
MOSFET; electric breakdown; MOSFET; RSO device concept; breakdown voltage; gate-to-drain charge; size 0.8 mum; size 1.3 mum; split-gate resurf stepped oxide; voltage 25 V; voltage 35 V; Capacitance; Electric resistance; MOSFETs; Power semiconductor devices; Shape; Silicon; Split gate flash memory cells; Switching converters; Switching loss; Voltage;
Conference_Titel :
Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
Conference_Location :
Jeju Island
Print_ISBN :
1-4244-1095-9
Electronic_ISBN :
1-4244-1096-7
DOI :
10.1109/ISPSD.2007.4294932