• DocumentCode
    3312388
  • Title

    Split-gate Resurf Stepped Oxide (RSO) MOSFETs for 25V applications with record low gate-to-drain charge

  • Author

    Goarin, P. ; Koops, G.E.J. ; van Dalen, R. ; Le Cam, C. ; Saby, J.

  • Author_Institution
    NXP Semicond., Leuven
  • fYear
    2007
  • fDate
    27-31 May 2007
  • Firstpage
    61
  • Lastpage
    64
  • Abstract
    This paper presents a split-gate version of the resurf stepped oxide (RSO) MOSFET. Splitting the gate enables a drastic reduction of the gate-to-drain capacitance intrinsic to the RSO device concept while keeping all the benefits of the RESURF effect. We achieved a record on- resistance of 3.8 mOmegamm2 and gate-to-drain charge of 0.9 nC.mm-2 at a breakdown voltage of 35 V for a pitch of 1.3 mum (0.8 mum trench width). The switching losses of our split-gate RSO MOSFET are 4 times better than the best published data in the same voltage range.
  • Keywords
    MOSFET; electric breakdown; MOSFET; RSO device concept; breakdown voltage; gate-to-drain charge; size 0.8 mum; size 1.3 mum; split-gate resurf stepped oxide; voltage 25 V; voltage 35 V; Capacitance; Electric resistance; MOSFETs; Power semiconductor devices; Shape; Silicon; Split gate flash memory cells; Switching converters; Switching loss; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
  • Conference_Location
    Jeju Island
  • Print_ISBN
    1-4244-1095-9
  • Electronic_ISBN
    1-4244-1096-7
  • Type

    conf

  • DOI
    10.1109/ISPSD.2007.4294932
  • Filename
    4294932