Title :
Discrete and Half Bridge Module using GaN HFETs for High Temperature Applications more than 200°C
Author :
Nomura, Takehiko ; Masuda, Mitsuru ; Yoshida, Seikoh ; Yamate, Tsutomu ; Sudo, Yukio ; Takeda, Jiro
Author_Institution :
Furukawa Electr. Co., Ltd., Furukawa
Abstract :
AlGaN/GaN HFETs are expected to be a good candidates for power switching application at high temperatures. We optimized the fabrication process of the AlGaN/GaN HFET. A low specific on-state resistance of 6.3 mOmegacm2 and a large breakdown voltage of 600 V were achieved at 225degC. We also designed and fabricated a half bridge module using the AlGaN/GaN HFETs and SiC SBDs. Switching characteristics of the AlGaN/GaN HFET were investigated. The small turn-on delay of 7.2 nsec, which is 1/10 of Si MOSFET, was observed. The switching characteristics of the HFET showed no significant degradation up to 225degC.
Keywords :
aluminium compounds; gallium compounds; power HEMT; wide band gap semiconductors; AlGaN-GaN; HFET; half bridge module; high electron mobility transistors; high temperature applications; power switching applications; switching characteristics; temperature 225 C; turn-on delay; voltage 600 V; Aluminum gallium nitride; Bridge circuits; Delay; Fabrication; Gallium nitride; HEMTs; MODFETs; MOSFET circuits; Silicon carbide; Temperature; GaN; HFET; high temperature; switching;
Conference_Titel :
Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
Conference_Location :
Jeju Island
Print_ISBN :
1-4244-1095-9
Electronic_ISBN :
1-4244-1096-7
DOI :
10.1109/ISPSD.2007.4294946