DocumentCode :
3313749
Title :
Logic Diagnosis and Yield Learning
Author :
Rajski, J.
Author_Institution :
Mentor Graphics Corp., Wilsonville
fYear :
2007
fDate :
11-13 April 2007
Firstpage :
19
Lastpage :
19
Abstract :
Summary form only given. In the past, logic diagnosis was primarily used to support failure analysis labs. It was typically done on a small sample of defective chips, therefore long processing times, manual generation of diagnostic patterns, and usage of expensive equipment was acceptable. In addition to failure analysis, yield learning relied on test chips and in-line inspection. Recently, sub-wavelength lithography processes have started introducing new yield loss mechanisms at a rate, magnitude, and complexity large enough to demand major changes in the process. Test chips are no longer able to represent the various failure mechanisms originating from critical features. The number of such features is too large to properly represent it on silicon in a cost-effective manner. For new processes it is also impossible to predict all significant features up front. With the decreasing sizes of defects and increasing percentage of invisible ones, in-line inspection data is not always available.
Keywords :
failure analysis; integrated circuit testing; integrated circuit yield; lithography; logic testing; silicon; Si; defective chips; failure analysis; in-line inspection; logic diagnosis method; silicon; sub-wavelength lithography processes; yield learning method; yield loss mechanisms;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Diagnostics of Electronic Circuits and Systems, 2007. DDECS '07. IEEE
Conference_Location :
Krakow
Print_ISBN :
1-4244-1161-0
Type :
conf
DOI :
10.1109/DDECS.2007.4295248
Filename :
4295248
Link To Document :
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