DocumentCode :
3318157
Title :
Criteria for one-dimensional transport in split-gate field-effect transistors
Author :
Eugster, C.C. ; del Alamo, Jesus A. ; Belk, P.A. ; Rooks, M.J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
fYear :
1990
fDate :
9-12 Dec. 1990
Firstpage :
335
Lastpage :
338
Abstract :
The authors have fabricated AlGaAs-GaAs split-gate field-effect transistors with different lengths and widths in order to establish geometric design criteria for one-dimensional (1D) transport. The experiments show a more negative 1D threshold voltage for zero length split-gate devices (constrictions) than for finite length split-gate devices for the same given width. The experiments reveal the existence of a critical width between the gates below which a 1D regime cannot be supported in split-gate FETs longer than 0.5 mu m.<>
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; 0.5 micron; 1D threshold voltage; AlGaAs-GaAs; MODFET; critical width; field-effect transistors; geometric design criteria; one-dimensional transport; split-gate FETs; FETs; Split gate flash memory cells; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1990.237162
Filename :
237162
Link To Document :
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