DocumentCode :
331839
Title :
Comparison of GaInNAs grown by MOCVD and CBE
Author :
Miyamoto, T. ; Kageyama, T. ; Schlenker, D. ; Makino, S. ; Koyama, F. ; Iga, K.
Author_Institution :
RCQEE, Tokyo Inst. of Technol., Yokohama, Japan
Volume :
1
fYear :
1998
fDate :
1-4 Dec 1998
Firstpage :
32
Abstract :
We investigated the difference between CBE and MOCVD grown GaInNAs. Photoluminescence characteristics showed similar tendency, while there are large differences in the nitrogen incorporation characteristics. Hydrogen in the nitrogen source may play an important role. Further improvement of GaInNAs quality will be achieved by clarifying the details of growth characteristics and mechanisms
Keywords :
III-V semiconductors; MOCVD; chemical beam epitaxial growth; gallium compounds; indium compounds; photoluminescence; semiconductor quantum wells; CBE; GaInNAs; GaInNAs quality; MOCVD; growth characteristics; nitrogen incorporation characteristics; nitrogen source; photoluminescence characteristics; Crystalline materials; Gallium arsenide; Hydrogen; MOCVD; Material properties; Nitrogen; Optical materials; Surface emitting lasers; Surface waves; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-4947-4
Type :
conf
DOI :
10.1109/LEOS.1998.737718
Filename :
737718
Link To Document :
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