• DocumentCode
    3318908
  • Title

    On the morphology and texture of InN thin films deposited by reactive RF-magnetron sputtering

  • Author

    Braic, Mariana ; Zoita, N.C. ; Braic, V.

  • Author_Institution
    Nat. Inst. for Optoelectron., Magurele-Bucharest, Romania
  • Volume
    02
  • fYear
    2010
  • fDate
    11-13 Oct. 2010
  • Firstpage
    383
  • Lastpage
    386
  • Abstract
    We report successful deposition of polycrystalline InN thin films on un-etched Si wafers, without nucleation buffer, by reactive RF magnetron sputtering in pure N2 atmosphere. The modification of the structural and morphological characteristics of InN films are presented, as function of deposition pressure and deposition temperature.
  • Keywords
    III-V semiconductors; indium compounds; semiconductor growth; semiconductor thin films; sputter deposition; texture; InN; Si; deposition pressure; deposition temperature; morphology; reactive RF-magnetron sputtering; structural property; texture; thin films; unetched Si wafers; Films; Rough surfaces; Sputtering; Substrates; Surface morphology; Surface roughness; Surface treatment; Indium nitride thin film; RF-magnetron sputtering; growth temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference (CAS), 2010 International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4244-5783-0
  • Type

    conf

  • DOI
    10.1109/SMICND.2010.5650626
  • Filename
    5650626
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3318908