DocumentCode :
3319573
Title :
CMOS cantilever microstructures as thin film deposition monitors
Author :
Spacek, Martin ; Brown, Keith B. ; Ma, Yuan ; Robinson, Alexander M. ; Lawson, Ron P W ; Allegretto, Walter
Author_Institution :
Dept. of Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
Volume :
3
fYear :
1999
fDate :
9-12 May 1999
Firstpage :
1648
Abstract :
Increasing the mass of an oscillating microcantilever causes a decrease in its vibrational resonant frequency. We have deposited MgF/sub 2/ on our CMOS designed cantilever-in-cantilever microdevices and observed the resonant frequency decrease linearly with layer thickness. With initial results showing a sensitivity on the order of Angstroms, such devices demonstrate potential for novel application as thin film monitors.
Keywords :
CMOS integrated circuits; microsensors; thickness measurement; thin films; CMOS microstructure; MgF/sub 2/; cantilever-in-cantilever microdevice; thickness measurement; thin film deposition monitor; vibrational resonant frequency; Aluminum; Crystalline materials; Electrical resistance measurement; Microstructure; Monitoring; Optical films; Optical materials; Resonant frequency; Semiconductor thin films; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical and Computer Engineering, 1999 IEEE Canadian Conference on
Conference_Location :
Edmonton, Alberta, Canada
ISSN :
0840-7789
Print_ISBN :
0-7803-5579-2
Type :
conf
DOI :
10.1109/CCECE.1999.804964
Filename :
804964
Link To Document :
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