Title :
Ab initio calculations of 3C-SiC(111)/Ti polar interfaces
Author :
Tanaka, S. ; Kohyama, M.
Author_Institution :
Dept. of Mater. Phys., Osaka Nat. Res. Inst., Japan
Abstract :
Ab initio pseudopotential calculations of the 3C-SiC(111)/Ti polar interface have been performed. The C-Ti bond at the C-terminated interface has strong p-d covalent interactions between C-2p and Ti-3d orbitals while the Si-Ti bond at the Si-terminated interface has metallic behaviour. Adhesive energy values for the Si- and the C-terminated interface are 4.673 and 5.213 Jm-2. The calculated value of the p-type Schottky-barrier height are different for each interface due to the difference of atomic and electronic structure between the interfaces
Keywords :
Schottky barriers; ab initio calculations; density functional theory; electronic density of states; interface structure; pseudopotential methods; silicon compounds; titanium; wide band gap semiconductors; 3C-SiC(111)/Ti polar interfaces; C-2p orbital; C-Ti bond; C-terminated interface; Si-Ti bond; Si-terminated interface; SiC-Ti; Ti-3d orbital; ab initio pseudopotential calculations; adhesive energy; metallic behaviour; p-d covalent interactions; p-type Schottky-barrier height; Adhesives; Atomic layer deposition; Bonding; Ceramics; Electrons; Orbital calculations; Physics; Silicon carbide; Slabs; Temperature;
Conference_Titel :
Semiconducting and Insulating Materials Conference, 2000. SIMC-XI. International
Conference_Location :
Canberra, ACT
Print_ISBN :
0-7803-5814-7
DOI :
10.1109/SIM.2000.939247