A Generalized Dill Exposure Model for Negative Thick Photoresist

Author

Liu, Ren ; Zheng, Jin Jin ; Zhou, H.J. ; Tian, Y.C. ; Liu, G. ; Shen, L.G.

Author_Institution

Univ. of Sci. & Technol. of China, Hefei

fYear

2007

fDate

8-11 July 2007

Firstpage

285

Lastpage

291

Abstract

In this paper, Dill´s classical exposure model for positive photoresist is generalized to fit negative photoresist. Based on Dill´s model, the differences between positive and negative photoresist is analyzed and then the equations of chemical kinetics inside the SU-8 negative photoresist are established. To consider the scattering and refraction of light in thick photoresist, angular spectrum theory is used to calculate the diffractive field inside thick photoresist. A new exposure model is established for negative thick photoresist.

Keywords

light refraction; light scattering; photoresists; reaction kinetics; Dill classical exposure model; SU-8 negative photoresist; angular spectrum theory; chemical kinetics; generalized Dill exposure model; light refraction; light scattering; negative thick photoresist; positive photoresist; Chemical analysis; Equations; Lighting; Lithography; Optical distortion; Optical refraction; Optical scattering; Photochemistry; Proximity effect; Resists; Exposure model; Lithography simulation; SU-8 photoresist; UV-LIGA;

fLanguage

English

Publisher

ieee

Conference_Titel

Information Acquisition, 2007. ICIA '07. International Conference on

Conference_Location

Seogwipo-si

Print_ISBN

1-4244-1220-X

Electronic_ISBN

1-4244-1220-X

Type

conf

DOI

10.1109/ICIA.2007.4295744

Filename

4295744