• DocumentCode
    3322447
  • Title

    Yield management practice by user designable YMS

  • Author

    Inokuchi, Masayuki

  • Author_Institution
    JEOL Syst. Technol. Co. Ltd., Tokyo
  • fYear
    2005
  • fDate
    11-12 April 2005
  • Firstpage
    261
  • Lastpage
    265
  • Abstract
    For a semiconductor manufacturer to remain competitive in the marketplace, it must have a highly effective yield-management system (YMS). However, traditional YMSs are frequently not as effective as expected. An extensive investigation of the causes for this failure reveals that: (i) conventional software-development methodologies might not extract correct specifications for a YMS; and (ii) the development time of such a YMS is often too long. This paper proposes a new concept - user-oriented engineering. This tries to make optimum use of the expertise of semiconductor engineers and promote their creativity. YMSs based on user-oriented engineering (UOE-YMSs) have been developed and have been in operation in a number of semiconductor factories for several years. As a result, yield-management tool development cost is dramatically reduced, expert semiconductor engineers have developed their own tools by themselves very quickly, and yields have been greatly enhanced. It is expected that this concept, and the tools developed based on it, can cope with difficulties caused by a future technology node
  • Keywords
    integrated circuit yield; production engineering computing; production management; semiconductor factories; semiconductor manufacturer; software-development methodologies; user designable yield-management system; user-oriented engineering; yield management practice; yield-management tool development cost; Costs; Electronics industry; Investments; Knowledge management; Manufacturing processes; Performance analysis; Production facilities; Programming; Semiconductor device manufacture; Stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI
  • Conference_Location
    Munich
  • Print_ISBN
    0-7803-8997-2
  • Type

    conf

  • DOI
    10.1109/ASMC.2005.1438806
  • Filename
    1438806