DocumentCode :
3322620
Title :
Demonstration of a W-band microstrip parallel coupled-line bandpass filter in GaAs technology
Author :
Lok, L.B. ; Hwang, C.-J. ; Thayne, I.G. ; Elgaid, K.
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Glasgow, Glasgow, UK
fYear :
2010
fDate :
21-21 April 2010
Firstpage :
37
Lastpage :
51
Abstract :
In this paper, we demonstrate the performance of a W-band (75-110GHz) parallel coupled-line bandpass filter implemented using a new in-house GaAs microstrip technology. The MMIC process at the University of Glasgow has recently been advanced to incorporate a new process module that includes wafer thinning, through-substrate via etching and backside processing capabilities. This enables the realization of microstrip and grounded coplanar waveguide monolithic circuits for microwave and millimetre-wave applications from a UK source [1]. To demonstrate an example of the high frequency performance of this new process module, a parallel coupled-line bandpass filter has been designed and realized on a 50μm thickness semi-insulating GaAs substrate.
Keywords :
III-V semiconductors; band-pass filters; coplanar waveguides; coupled transmission lines; etching; field effect MIMIC; gallium arsenide; microstrip filters; millimetre wave filters; GaAs; MMIC process; University of Glasgow; W-band microstrip parallel coupled-line bandpass filter; backside processing capabilities; frequency 75 GHz to 110 GHz; grounded coplanar waveguide monolithic circuits; in-house microstrip technology; microwave application; millimetre wave application; semiinsulating gallium arsenide substrate; size 50 mum; through-substrate via etching; wafer thinning;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Passive RF and Microwave Components, IET Seminar on
Conference_Location :
Birmingham
Type :
conf
DOI :
10.1049/ic.2010.0174
Filename :
6151893
Link To Document :
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