Title :
Multiple-aperture electrostatic lens systems employed in a vacuum microelectronic field emitter environment
Author :
Kane, Robert C. ; Wong, Thomas
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA
Abstract :
A number of electrostatic lens focusing systems employing the axially symmetric noncoplanar aperture lens technique for use with arrays of microelectronic field emission devices [FEDs] are described. In particular, multiple-aperture lens systems are found to provide improved focusing performance with significantly reduced aberration
Keywords :
aberrations; electron beam focusing; electron field emission; electrostatic lenses; vacuum microelectronics; aberrations; axially symmetric noncoplanar aperture lens technique; field emission device; field emitter array; focusing system; multiple-aperture electrostatic lens; vacuum microelectronics; Acceleration; Apertures; Electron beams; Electrostatics; Focusing; Lenses; Microelectronics; Vacuum systems; Vacuum technology; Voltage;
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
DOI :
10.1109/IVMC.2001.939676
