• DocumentCode
    3327169
  • Title

    Low leakage current fabrication of optically gated silicon field emitter arrays

  • Author

    Liu, K.X. ; Heritage, J.P.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., California Univ., Davis, CA, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    125
  • Lastpage
    126
  • Abstract
    Photofield emission from gated silicon field emitter array showed improvements on efficiency and dynamic range at the expense of higher dark current as the gate voltage increased. For 830 nm, efficiency approached 19% and dynamic range approached 7.2 at 100 V. Measured saturation behavior was attributed to screening of the applied field. Ratio of field emission current over leakage current peaked at 75 before the onset of current interception by the gate. Nanosecond time scale response was detected with short pulse excitation at 82 MHz repetition
  • Keywords
    electron field emission; elemental semiconductors; leakage currents; silicon; vacuum microelectronics; 100 V; 19 percent; 82 MHz; 830 nm; Si; dark current; dynamic range; fabrication; field emission current; field screening; leakage current; optically gated silicon field emitter array; photofield emission; quantum efficiency; saturation current; short pulse excitation; Dark current; Dynamic range; Dynamic voltage scaling; Field emitter arrays; Leakage current; Optical device fabrication; Optical saturation; Silicon; Stimulated emission; Time factors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939685
  • Filename
    939685