DocumentCode
3327169
Title
Low leakage current fabrication of optically gated silicon field emitter arrays
Author
Liu, K.X. ; Heritage, J.P.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Davis, CA, USA
fYear
2001
fDate
2001
Firstpage
125
Lastpage
126
Abstract
Photofield emission from gated silicon field emitter array showed improvements on efficiency and dynamic range at the expense of higher dark current as the gate voltage increased. For 830 nm, efficiency approached 19% and dynamic range approached 7.2 at 100 V. Measured saturation behavior was attributed to screening of the applied field. Ratio of field emission current over leakage current peaked at 75 before the onset of current interception by the gate. Nanosecond time scale response was detected with short pulse excitation at 82 MHz repetition
Keywords
electron field emission; elemental semiconductors; leakage currents; silicon; vacuum microelectronics; 100 V; 19 percent; 82 MHz; 830 nm; Si; dark current; dynamic range; fabrication; field emission current; field screening; leakage current; optically gated silicon field emitter array; photofield emission; quantum efficiency; saturation current; short pulse excitation; Dark current; Dynamic range; Dynamic voltage scaling; Field emitter arrays; Leakage current; Optical device fabrication; Optical saturation; Silicon; Stimulated emission; Time factors;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location
Davis, CA
Print_ISBN
0-7803-7197-6
Type
conf
DOI
10.1109/IVMC.2001.939685
Filename
939685
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