DocumentCode :
3327169
Title :
Low leakage current fabrication of optically gated silicon field emitter arrays
Author :
Liu, K.X. ; Heritage, J.P.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Davis, CA, USA
fYear :
2001
fDate :
2001
Firstpage :
125
Lastpage :
126
Abstract :
Photofield emission from gated silicon field emitter array showed improvements on efficiency and dynamic range at the expense of higher dark current as the gate voltage increased. For 830 nm, efficiency approached 19% and dynamic range approached 7.2 at 100 V. Measured saturation behavior was attributed to screening of the applied field. Ratio of field emission current over leakage current peaked at 75 before the onset of current interception by the gate. Nanosecond time scale response was detected with short pulse excitation at 82 MHz repetition
Keywords :
electron field emission; elemental semiconductors; leakage currents; silicon; vacuum microelectronics; 100 V; 19 percent; 82 MHz; 830 nm; Si; dark current; dynamic range; fabrication; field emission current; field screening; leakage current; optically gated silicon field emitter array; photofield emission; quantum efficiency; saturation current; short pulse excitation; Dark current; Dynamic range; Dynamic voltage scaling; Field emitter arrays; Leakage current; Optical device fabrication; Optical saturation; Silicon; Stimulated emission; Time factors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939685
Filename :
939685
Link To Document :
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